Ultrapure Ion Exchange Resins
Diaion Styrenic Mixed Bed Resin H/OH
Sorbtech offers several grades of mixed resin for non-regenerable mixed bed ion exchange applications.
All mixed resins are typically offered in a 1:1 stoichiometric ratio (1 equivalence of cation equilibrium capacity to 1 equivalence of anion equilibrium capacity).
Catalog No. | Description | Price (USD) |
---|---|---|
SMNUPB-25L | Diaion Styrenic Mixed Bed Resin H/OH, Ultra Pure, 300-1180um, 25L Bag | Inquire |
SMT100L-25L | Diaion Styrenic Mixed Bed Resin H/OH, Ultra High Purity, Resistivity: >18 mOhm*Cm (3 hr), 300-1180um, 25L | Inquire |
SMT200L-25L | Diaion Styrenic Mixed Bed Resin H/OH, Ultra High Purity, Resistivity: >18.1 mOhm*Cm (12 hr), 300-1180um, 25L | Inquire |
The Diaion SMNUP mixed resin is offered for critical applications which require high purity treated water. This mixed resin is prepared from component resins which have been prepared with a high degree of purity and conversion to the H/OH form. Diaion SMNUP if often supplied for applications which require nuclear grade resin.
SMT100L and SMT200L are manufactured to very stringent performance specifications, and prepared from component resins with the highest degree of conversion and considerations of purity. They will also provide exceptional performance relative to electrical resistivity and TOC leakage. In fact, rinse to 18 megaohm resistivity is near instantaneous, and clearly superior to conventional mixed bed resins. The performance for TOC meets or exceeds all conventional mixed bed resins. The TOC rinse down performance is maintained over 12 month’s storage.
Diaion SMT200L also offers remarkable performance relative to metals leakage. The cation component, SKT20L, has been prepared with low levels of metals in the resin phase (500 ppb). This improvement allows ppt metals leakage in the product water quality (actual performance is <0.1 ppt for 13 metals within 4 hrs of rinse).
Product | Matrix | Total Capacity (meq/mL-r) | Water Retention (%) | Conversion (eq%) | Brandname |
---|---|---|---|---|---|
SMNUP | Gel (Styrene, DVB): with Ionic for H/OH | > 1.7 cation > 0.9 anion |
50-60 cation 62-72 anion |
> 99 H form > 90 OH form | Diaion |
SMT100L | Gel (Styrene, DVB): with Ionic for H/OH | > 1.7 cation > 0.9 anion |
50-60 cation 62-72 anion |
> 99.9 H form > 90.0 OH form < 1.0 Cl form | Diaion |
SMT200L | Gel (Styrene, DVB): with Ionic for H/OH | > 1.7 cation > 0.9 anion |
50-60 cation 62-72 anion |
> 99.9 H form > 90.0 OH form < 1.0 Cl form | Diaion |
Product | Patricle Size Distribution | Effective Size (mm) | Uniformity Coefficient | Resistivity (m Ω. Cm) |
TOC (ppb) | Metal Content (ppt/dry resin) | Counter Ion |
---|---|---|---|---|---|---|---|
SMNUP | On 1180µm: 5% max Thru 300µm: 1% max |
0.40 min | 1.6 max | >15 (30 min) | - | - | - |
SMT100L | On 1180µm: 5% max Thru 300µm: 1% max |
0.40 min | 1.6 max | > 18 (3 hrs) | <10 (3 hrs) | - | - |
SMT200L | On 1180µm: 5% max Thru 300µm: 1% max |
0.40 min | 1.6 max | >18.1 (12 hrs) | <10 (3 hrs) | <0.1 (12 hrs) | <10 (12 hrs) |
Diaion SKT10L is a premium grade, gel-type strong acid cation exchange resin based on a crosslinked polystyrene matrix with sulfonic acid functional groups. Diaion SKT10L is prepared in the hydrogen form with special attention to resistivity rinse up, TOC and metal leachables. Diaion SKT10L is used as the cation component for Diaion SMT100 non-regenerable mixed bed resin. This ultra-high-purity mixed bed resin is recommended for semiconductor plant final polishing loop applications. An improved copolymerization process provides low level TOC leachables. SKT10L is remarkable for its extremely low content of ionic contaminants in the resin phase. Diaion SKT10L is recommended for critical applications requiring low metal leakage.
Diaion SAT10L is a premium grade, gel-type strong base, Type I, anion exchange resin based on a crosslinked polystyrene matrix with quaternary ammonium functional groups. Diaion SAT10L is prepared with an extremely high conversion to the hydroxide form with special attention to resistivity rinse up, TOC and metal leachables. Diaion SAT10L is used as the anion component for Diaion SMT100 non-regenerable mixed bed resin. This ultra-high-purity mixed bed resin is recommended for semiconductor plant final polishing loop applications. SAT10L is remarkable for its extremely low content of ionic contaminants in the resin phase. The method of preparation provides TOC leakage in the ppb range.
Diaion SKT20L is an improved version of Diaion SKT10L since it has been prepared with low levels of metals in the resin phase (500 ppb). This improvement allows ppt metals leakage in the product water quality (actual performance is <0.1 ppt for 13 metals within 4 hrs of rinse). Diaion SAT20L is an improved version of Diaion SAT10L since it has been prepared with low levels of metals in the resin phase (500 ppb). This improvement allows ppt metals leakage in the product water quality (actual performance is <0.1 ppt for 13 metals within 4 hrs of rinse).
Product | Matrix | Total Capacity (meq/mL-r) | Water Retention (%) | Conversion (eq%) | Brandname |
---|---|---|---|---|---|
SKT10L | Gel (Styrene, DVB) | > 1.7 | 50-60 | > 99 H form > 90 OH form | Diaion |
SAT10L | Gel (Styrene, DVB) | >0.9 | 62-72 | > 99.9 H form > 90.0 OH form < 1.0 Cl form | Diaion |
SKT20L | Gel (Styrene, DVB) | > 1.7 | 50-60 | > 99.9 H form > 90.0 OH form < 1.0 Cl form | Diaion |
SAT20L | Gel (Styrene, DVB) | >0.9 | 62-72 | > 99.9 H form > 90.0 OH form < 1.0 Cl form | Diaion |
Product | Patricle Size Distribution | Effective Size (mm) | Uniformity Coefficient | Resistivity (m Ω. Cm) |
TOC (ppb) | Metal Content (ppt/dry resin) | Counter Ion |
---|---|---|---|---|---|---|---|
SKT10L | On 1180µm: 5% max Thru 425µm: 1% max |
0.45 min | 1.6 max | >12 (3 hrs) | <20 (3 hrs) | - | >99.9 H form |
SAT10L | On 1180µm: 5% max Thru 425µm: 1% max |
0.45 min | 1.6 max | > 15 (3 hrs) | <20 (3 hrs) | - | >90.0 OH form |
SKT20L | On 1180µm: 5% max Thru 425µm: 1% max |
0.45 min | 1.6 max | >16 (12 hrs) | <5 (12 hrs) | Na, Ca, Fe, Zn <1000 | >99.9 H form |
SAT20L | On 1180µm: 5% max Thru 425µm: 1% max |
0.45 min | 1.6 max | >18.1 (12 hrs) | <1.0 (12 hrs) | Na, Ca, Fe, Zn <1000 | >90.0 OH form |